NB INSTRUMENT
nanoCHEM
Wet processing for substrates from research format to large-area manufacturing.
A process matched to the substrate.
The nanoCHEM range covers developing, cleaning, etching and lift-off across six substrate-size classes.
A standalone unit is available, with manual or automatic loading depending on the selected workflow.
From chemistry to controlled throughput.
Developing
Controlled developing for patterned substrate workflows.
Cleaning
Wet cleaning in preparation for subsequent steps.
Etching
Wet chemical removal for process-defined material layers.
Lift off
Remove unwanted material after patterning.
Standalone option
Configure as an independent processing unit.
Loading choice
Manual or automatic substrate loading.
Substrate-size range.
| nanoCHEM 450 | Up to 320 × 320 mm |
|---|---|
| nanoCHEM 750 | Up to 535 × 535 mm |
| nanoCHEM 1,200 | Up to 850 × 850 mm |
| nanoCHEM 1,400 | Up to 1,000 × 1,000 mm |
| nanoCHEM 1,800 | Up to 1,300 × 1,300 mm |
| nanoCHEM 2,800 | Up to 2,000 × 2,000 mm |
Maximum substrate sizes supplied for each nanoCHEM processing class; confirm chosen chemistry, automation and process configuration with NB Instrument.
Wet processing across scales.
- Developing
- Cleaning
- Etching
- Lift off
Tell us what you are working on.
Start with the research objective. We’ll help connect the requirement to the right technology path.
Discuss your requirement