NB INSTRUMENT
Overview
Advanced Precision PVD Coating
An advanced magnetron sputtering platform engineered for high-performance thin film deposition and industrial PVD coating applications.
Key features
Precision from source to surface.
01
Advanced Magnetron Sputtering Technology
Industry-leading sputtering performance for superior thin film quality.
02
Multipole Variable Magnetic Field Design
Precision magnetic configuration enabling exceptional plasma control.
03
Multi-Power Compatibility
Supports DC, MF and HiPIMS power configurations for process flexibility.
04
High Target Utilisation & Process Efficiency
Optimised erosion profiles maximise material yield and reduce cost per coating.
Specifications
System specification.
| Technology | Magnetron Sputtering PVD |
|---|---|
| Coating Method | Thin film physical vapour deposition |
| Power Supply Options | DC / MF / HiPIMS |
| Magnetic Field Design | Multipole variable magnetic field |
| Plasma Capability | High-density plasma generation |
| Coating Types | Hard, decorative & functional coatings |
| Process Flexibility | Conductive & insulating materials |
| System Configurations | M250-G2 / M500-G2 |
| Production Scale | R&D to medium-scale manufacturing |
| Process Control | Precision magnetic & plasma control |
Applications
From laboratory films to industrial coatings.
- Thin Film Deposition
- Industrial PVD Coating
- Semiconductor & Electronics Coatings
- Optical & Protective Coatings
- Research & Development Laboratories
Technologies
Thin Film & PVD Coating
Magnetron sputtering with configurable power and magnetic-field control for demanding thin-film applications.
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